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Citations for Microchem :
201 - 214 of 214 citations for 8 Benzylthio 6 oxo octanoic Acid Methyl Ester d4 since 2020
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Neuroscience 2022Quote: ... The wafer was inserted in the spin coater (WS-650-23NPP, Laurell) to deposit one layer of SU-8 2050 negative photoresist (Microchem) to obtain a thickness of 35 μm ...
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bioRxiv - Biophysics 2024Quote: ... the wafer was treated with air plasma (Harrick plasma, PDC-002, 30W) for 10 min before the SU-8 2025 photoresist (Microchem) was spin-coated according to the products protocols ...
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bioRxiv - Cell Biology 2024Quote: ... a master mold for replication of the device design in polydimethylsiloxane (PDMS) was fabricated from SU-8 photoresist (MicroChem, USA) spin-coated on a 3″ Si wafer ...
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bioRxiv - Cell Biology 2024Quote: A 4-inch silicon wafer (UniversityWafer, Inc., US) was first coated with an 80 µm-thick layer of photoresist (SU-8 2025, MicroChem, US) using a spin coater (spinNXG-P1 ...
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bioRxiv - Bioengineering 2023Quote: ... PDMS mixture (10:1 elastomer base to curing agent, w/w) was degassed and poured onto SU-8 (MicroChem, MA, USA) patterned wafer and cured at 80°C for 1 h ...
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bioRxiv - Synthetic Biology 2023Quote: ... was spin-coated onto silicon wafers and patterned by UV exposure through a photolithography mask and subsequent development (SU-8 developer; MicroChem Corp.). From the photoresist masters ...
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bioRxiv - Bioengineering 2021Quote: ... by UV (365nm with 11.1mW/cm2) exposure (UV-KUB 2, KLOE, France) of a 75 μm thick layer of SU-8 2075 photoresist (MicroChem Corporation, USA) for 20s ...
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bioRxiv - Cell Biology 2021Quote: ... The master wafer was prepared by sequentially spin-coating the wafer with two layers of SU-8 negative photoresist (Microchem, Newton, MA) and patterning by exposure to UV light through the two chrome masks ...
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bioRxiv - Biophysics 2023Quote: ... A positive master mould containing microstructures of twelve-cornered stars of different widths (1000 and 2000µm) and corner angles (30°, 60°, 90° and 120°) were fabricated via photolithography using SU-8 2050 (MicroChem, Newton, MA, USA). The height of all the star structures was 100µm ...
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bioRxiv - Plant Biology 2023Quote: ... A silicon wafer was used to fabricate 20-µm-thick negative masters with an ultrathick SU-8 3010 photoresist (Y301186, MicroChem, Westborough, USA) for PDMS micro-flow channels molding ...
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bioRxiv - Cell Biology 2023Quote: ... Silicon wafers were preheated at 180 °C for 30 min and overlayed with a 45 μm thick layer of SU-8-25 photoresist (Microchem, Newton, MA)by spin coating at 1300 rpm ...
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bioRxiv - Genomics 2020Quote: ... Photomasks designed by AutoCAD were printed on transparencies and the features on the photomask transferred to a silicon wafer (University Wafer) using negative photoresist (MicroChem, SU-8 2025) by UV photolithography ...
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bioRxiv - Evolutionary Biology 2022Quote: ... The chip mould with a uniform height of 23.5μm was obtained by spin-coating a silicon wafer (4 inches; Siltronix, France) with a negative photoresist (SU-8 2035, MicroChem Corp., Newton, MA, USA) according to manufacturer’s instructions ...
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bioRxiv - Cell Biology 2023Quote: ... and placed in a clean room on top of 76.2 mm silicon wafers (University Wafer, 447) to produce by photolithography 60 µm depth molds using SU-8 2050 photoresist (Microchem, now Kayaku Advanced Materials, Inc.). A 10:1 mixture of Sylgard 184 elastomer Polydimethylsiloxane (PDMS ...