Labshake search
Citations for Microchem :
51 - 100 of 214 citations for 8 Benzylthio 6 oxo octanoic Acid Methyl Ester d4 since 2020
Citations are collected from bioRxiv only, the total number of publications could be much larger.
-
bioRxiv - Biophysics 2022Quote: ... devices produced on SU-8 (Microchem) moulds which were fabricated via photolithographic processes.79–81 Syringe pumps (neMESYS modules ...
-
bioRxiv - Neuroscience 2021Quote: ... developed using SU-8 developer (MicroChem) for 6 min ...
-
bioRxiv - Biophysics 2021Quote: ... a SU-8 3010 (MicroChem Inc.) thin film was spin-coated onto the wafer to a height of 20 μm ...
-
bioRxiv - Genomics 2021Quote: ... developed using SU-8 developer (MicroChem) for 60 s ...
-
bioRxiv - Neuroscience 2021Quote: ... SU-8 2002 (MicroChem, MA, USA) was spin-coated to a thickness of 3 µm (10 s at 500 rpm then 30 s at 1000 rpm) ...
-
Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... developed using SU-8 developer (MicroChem) for 60 s ...
-
bioRxiv - Bioengineering 2023Quote: ... developed in SU-8 developer (Microchem) for 45 min ...
-
bioRxiv - Bioengineering 2023Quote: ... SU-8 2025 photoresist (MicroChem, Y111069) was coated at a thickness of 30 μm onto mechanical-grade silicon wafers (University Wafer ...
-
bioRxiv - Bioengineering 2024Quote: ... developed using SU-8 developer (MicroChem), rinsed by isopropyl alcohol (IPA) ...
-
bioRxiv - Genomics 2021Quote: ... The SU-8 lithography is performed on a 4 inch silicon wafer using SU 8-2050 (Microchem) negative photoresist using UV aligner (EVG-620) ...
-
bioRxiv - Neuroscience 2024Quote: ... the transistors were insulated with a 3-µm-thick photodefinable SU-8 epoxy photoresist (SU-8 2005 Microchem), keeping uncovered the active area of the transistors channel ...
-
bioRxiv - Bioengineering 2020Quote: ... using the negative resin SU-8 (MicroChem). The microchannels have a final height of 150 μm ...
-
bioRxiv - Biophysics 2020Quote: ... The first layer of SU-8 (MicroChem) was spin-coated on the coverslip and baked at 65 °C for 1 min ...
-
bioRxiv - Bioengineering 2022Quote: ... SU-8 2050 (MicroChem Corporation, Westborough, MA), a negative photoresist ...
-
bioRxiv - Cancer Biology 2020Quote: ... The SU-8 3050 photoresist (MicroChem Corp.) was coated on the mold of the growth channels under the same conditions as employed during the SU-8 3025 coating ...
-
bioRxiv - Cancer Biology 2020Quote: ... the photoresist SU-8 3025 (MicroChem Corp.) was cast on a silicon wafer (ID 447 ...
-
bioRxiv - Developmental Biology 2021Quote: ... The photoresist (SU-8 2010, Microchem, USA) was spin coated for 30 s at 1,000 rpm (target thickness ...
-
bioRxiv - Bioengineering 2022Quote: ... Two SU-8 100 layers (MicroChem Corp) were coated on a microscope slide to achieve a thickness of 400 µm in height ...
-
bioRxiv - Bioengineering 2023Quote: ... a negative photoresist SU-8 3025 (MicroChem) was spin-coated on a 3-inch silicon wafer to the desired thickness ...
-
bioRxiv - Bioengineering 2024Quote: ... a layer of SU-8 2002 (Microchem) was spin coated at 6000 rpm (ramp 500 rpm/s ...
-
bioRxiv - Neuroscience 2024Quote: ... Negative photoresist SU-8 2150 (Microchem, USA) was spin-coated on a 4-inch silicon wafer (Semiconductor Wafer ...
-
bioRxiv - Biophysics 2024Quote: ... SU-8 developer solution (MicroChem, Newton, MA) was used to dissolve unexposed parts of the photoresist ...
-
bioRxiv - Neuroscience 2022Quote: ... Fluidic channels were patterned by photolithography of a 40 µm spun coated SU-8 layer (SU-8 3025, MicroChem), followed by photolithography of a laminated 40 µm SU-8 dry film ...
-
bioRxiv - Bioengineering 2023Quote: ... Master moulds were fabricated in a cleanroom environment (Class ISO6) using multilayer direct laser writing (Heidelberg MLA100) of SU-8 2035 or SU-8 2100 (MicroChem) onto 102 mm silicon wafer substrates.
-
bioRxiv - Biophysics 2021Quote: ... Negative photoresist SU-8 3025 (MicroChem, Newton, MA) was spin-coated onto clean silicon wafers to a thickness of 10 μm ...
-
bioRxiv - Bioengineering 2020Quote: ... wafers were coated with SU-8 2010 (MicroChem) at a height of 15 μm (spin 10s - 500rpm ...
-
bioRxiv - Plant Biology 2021Quote: ... After development using SU-8 developer (MicroChem Corp.), PDMS mixed with a curing reagent at a ratio of 10:1 was poured onto the mold ...
-
bioRxiv - Genomics 2022Quote: ... One layer of photoresist (Microchem, SU-8 2075) is spun onto a silicon wafer at a thickness of 100 μm ...
-
bioRxiv - Biophysics 2022Quote: A first layer of SU-8 2002 (MicroChem) is spin-coated on a silicon wafer to obtain a final thickness of 1.5 μm ...
-
bioRxiv - Cancer Biology 2022Quote: ... Negative photoresist SU-8 3035 (MicroChem, Newton, MA) was spin-coated onto a silicon wafer at 4,500 rpm to a thickness of 30 µm ...
-
bioRxiv - Bioengineering 2022Quote: ... the SU-8 film was developed (Microchem developer), rinsed with isopropanol ...
-
bioRxiv - Developmental Biology 2021Quote: ... One layer of photoresist (SU-8 2075, Microchem) is spun onto a silicon wafer at a thickness of 110μm ...
-
bioRxiv - Microbiology 2022Quote: ... Thin layers of SU-8 3025 photoresist (MicroChem) were applied to 3-inch silicon wafers (University Wafers ...
-
bioRxiv - Synthetic Biology 2022Quote: ... SU-8 photoresist (Microchem 3025, Kayaku Advanced Materials) was used to generate the channel features with a height of 40 μm ...
-
bioRxiv - Biophysics 2023Quote: ... A 50 μm photoresist (SU-8, 3050, MicroChem) was spin-coated onto a silicon wafer ...
-
bioRxiv - Biophysics 2023Quote: ... were first fabricated as SU-8 molds (MicroChem) through standard photolithographic processes and then produced as polydimethylsiloxane (PDMS ...
-
bioRxiv - Biophysics 2023Quote: ... 82 by spinning SU-8 3025 photoresist (MicroChem) onto a polished silicon wafer to a height of around 25 µm ...
-
bioRxiv - Biophysics 2024Quote: ... By spin-coating of SU-8 2002 (MicroChem) at 3000 rpm ...
-
bioRxiv - Bioengineering 2020Quote: Microfluidic devices for making 50 μm and 100 μm diameter drops were fabricated by patterning SU-8 photoresist (Microchem SU-8 3050) on silicon wafers (University Wafer ...
-
bioRxiv - Immunology 2021Quote: ... The wafer master of SU-8 photoresist layer (MicroChem) with ~40 μm of thickness were manufactured using soft-lithography3 and microfluidic chips were fabricated using poly-dimethylsiloxane (PDMS ...
-
bioRxiv - Bioengineering 2020Quote: ... The wafer was patterned with SU-8 3050 (Microchem) features and was silane-treated to facilitate gel release as previously described by our group74 ...
-
bioRxiv - Cell Biology 2022Quote: ... After photoresist development with SU-8 developer (MicroChem, US) for 5 minutes ...
-
Matrix-seq: An adjustable-resolution spatial transcriptomics via microfluidic matrix-based barcodingbioRxiv - Bioengineering 2022Quote: ... A thin layer of SU-8 photoresist (Microchem, USA) was spin-coated and patterned by ultraviolet exposure on a silicon wafer ...
-
bioRxiv - Systems Biology 2020Quote: ... the features were developed using SU-8 developer (MicroChem). The master was treated overnight with vapor phase (tridecafluoro-1,1,2,2-tetrahydrooctyl ...
-
bioRxiv - Bioengineering 2021Quote: ... A layer of photoresist SU-8 50 (MicroChem Inc.) was spin-coated onto a plasma-cleaned silicon wafer ...
-
bioRxiv - Bioengineering 2022Quote: ... A 7 μm thick SU-8 2007 (MicroChem Corp.) was spin coated on the PET film at 3,000 rpm for 40 s ...
-
bioRxiv - Bioengineering 2023Quote: ... developed in an SU-8 developer solution (MicroChem, Y020100), and washed with isopropanol ...
-
bioRxiv - Immunology 2024Quote: ... and the SU-8 2025 epoxy-based photoresist (MicroChem) was carefully poured onto it at 95 °C ...
-
bioRxiv - Bioengineering 2024Quote: ... the wafer was incubated in SU-8 developer (Microchem) for 10 minutes ...
-
bioRxiv - Microbiology 2022Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...