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Citations for Microchem :
151 - 200 of 214 citations for 8 Benzylthio 6 oxo octanoic Acid Methyl Ester d4 since 2020
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Bioengineering 2022Quote: ... The master molds for the PDMS layers were made using SU-8 100 (Microchem) which were spin-coated onto wafers ...
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bioRxiv - Cell Biology 2022Quote: ... we performed two cycles of spin-coating negative photoresist (SU-8, Microchem, Newton, MA) and exposure to ultraviolet (UV ...
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bioRxiv - Bioengineering 2020Quote: ... and (5) developing away uncured photoresist using SU-8 developer (Microchem Corp, Newton, MA) according to standard manufacturer instructions ...
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bioRxiv - Cell Biology 2021Quote: ... master molds were made by spin-coating SU-8 2005 resin (MicroChem Corp., USA) on silicon wafers using a spincoater (Laurell Technologies ...
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bioRxiv - Genomics 2023Quote: ... A layer (∼30 μm in thickness) of SU-8 2025 photoresist (MicroChem, Y111069 0500L1GL) was coated on a 3-inch silicon wafer (University Wafer ...
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bioRxiv - Biophysics 2023Quote: ... created using ultraviolet (UV) photoresist lithography with SU-8 negative resist (SU8 3010, Microchem). The resists were then cured using UV light exposure through photomasks designed in CAD software and printed by CAD/Art Services ...
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bioRxiv - Bioengineering 2023Quote: ... Mold for layer #4 is fabricated using SU-8 2025 (MicroChem, Newton, MA, USA) spin-coated at 4000rpm for 30s to create ∼20μm tall channels (Figure S2b) ...
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bioRxiv - Genomics 2020Quote: ... The features on the photomask were transferred to a negative photoresist (MicroChem, SU-8 2025) on a silicon wafer (University Wafer ...
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bioRxiv - Biochemistry 2021Quote: ... Undeveloped photoresist is washed off with SU-8 developer (1-methoxy-2-propanol acetate, MicroChem).
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bioRxiv - Plant Biology 2021Quote: ... the silicon wafer was spin-coated with SU-8 3050 (MicroChem Corp., Newton, MA, USA) at 1750 rpm for 60 s and baked at 95°C for 30 min ...
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bioRxiv - Biophysics 2020Quote: ... the MVAS-Force consists of three layers fabricated through mold replication from SU-8 (Microchem) masters made with standard photolithographic methods on polished silicon wafers (Universitywafers.com) ...
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bioRxiv - Cancer Biology 2023Quote: ... After patterning the design on a silicon wafer using photolithography with SU-8 photoresist (MicroChem), PDMS (Sylgard 184 ...
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bioRxiv - Animal Behavior and Cognition 2023Quote: ... molds were made using negative UV photoresist (SU-8 2025, Kayaku Advanced Materials, [formerly Microchem]) spun coat onto silicon wafers (10 s at 500 rpm ...
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bioRxiv - Cancer Biology 2021Quote: ... The design was patterned on a silicon wafer by photolithography with SU-8 (2050) photoresist (MicroChem). PDMS devices were then fabricated by pouring PDMS (Sylgard 184 ...
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bioRxiv - Cell Biology 2023Quote: ... dried using a nitrogen gas and used immediately for SU-8 2000 (Kayaku Advanced Materials, MicroChem) spin coating ...
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bioRxiv - Bioengineering 2023Quote: ... Negative master molds were made with Nano SU-8-100 photoresist (Microchem, Round Rock, TX, USA) on 3 silicon wafers (University Wafer Inc. ...
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bioRxiv - Bioengineering 2023Quote: ... The PDMS casting mold was fabricated by photolithography patterning of 50 μm SU-8 resist (Microchem 3025 ...
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bioRxiv - Genomics 2021Quote: ... We followed the manufacturer’s guidelines to spin coat SU-8 negative photoresist (SU-2010, SU-2025, Microchem) on a silicon wafer (C04004 ...
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bioRxiv - Bioengineering 2020Quote: Standard soft lithography techniques67 were used to fabricate an SU-8 (Kayaku Advanced Materials, formerly Microchem Corp.) master mold for sets of four microfluidic funnels for worm confinement as described53 ...
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bioRxiv - Cell Biology 2021Quote: ... The master molds were made using standard soft-photolithography processes using SU-8 2025 photoresist (Microchem, USA). The designs were made on AutoCAD (available upon request ...
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bioRxiv - Microbiology 2022Quote: ... A silicon mold of HIC was fabricated using the negative photoresist SU–8 (MicroChem Corp., Westborough, MA) by photolithography (22) ...
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bioRxiv - Biophysics 2021Quote: Substrates for EBL were prepared directly after HMDS treatment by spin coating SU-8 2001 (Microchem Corp.) to a desired thickness of 500 nm and 1000 nm ...
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bioRxiv - Neuroscience 2023Quote: ... Silicon-wafer masters were created by exposing a layer of SU-8 2025 resist (Microchem, Newton, MA) through a transparency mask and developing the master in a bath of glycol monomethyl ether acetate (PGMEA) ...
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bioRxiv - Bioengineering 2023Quote: ... the wafer underwent a post-exposure bake and was developed in a SU-8 developer solution (MicroChem). The baking durations and exposure dosage followed the manufacturer’s instructions ...
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bioRxiv - Animal Behavior and Cognition 2023Quote: ... first a positive mold was created by photolithography of a layer of photoresist (SU-8 2008, Microchem) on a 4 inch silicon wafer [50] ...
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bioRxiv - Biophysics 2024Quote: Silicon wafers (Microchemicals GmbH, Ulm, Germany) were coated with SU-8 photoresist (Series 3005, MicroChem, Newton, USA) using a two-step spin-coating process ...
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bioRxiv - Biophysics 2024Quote: ... Molds were fabricated by spin coating a layer of the negative photoresist SU-8 (MicroChem Newton, MA) (SU-8 3050 ...
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bioRxiv - Bioengineering 2021Quote: ... a negative-relief master was lithographically fabricated onto a polished silicon substrate using SU-8 epoxy photoresist (MicroChem) (SU-8 3025 for MCF-10A devices ...
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bioRxiv - Microbiology 2020Quote: ... The mixture was casted onto a silicon wafer having different patterns of SU-8 2100 (MicroChem, MA, USA) and AZ-50 (AZ Electronic Materials ...
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bioRxiv - Bioengineering 2023Quote: ... and O2 plasma treated (Harrick Plasma) for 2 min prior to coating with SU-8 photoresist (MicroChem, Kayaku) using a spin-coater ...
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bioRxiv - Cell Biology 2021Quote: ... a post-exposure bake identical to the soft bake was performed before development using SU-8 developer (Microchem, USA).
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bioRxiv - Biophysics 2020Quote: ... devices for droplet generation and multilayer well-devices for droplet collection and imaging were produced on SU-8 (Microchem) moulds fabricated via photolithographic processes as described previously83–85.
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bioRxiv - Biophysics 2022Quote: ... devices for droplet generation and multilayer well-devices for droplet collection and imaging were produced on SU-8 (Microchem) moulds fabricated via photolithographic processes as described previously.57–59 Further details are provided in the Supporting Information.
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bioRxiv - Microbiology 2020Quote: ... The master molds were fabricated in a cleanroom environment through a two-step photolithography procedure of SU-8 (Microchem) on silicon wafers ...
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bioRxiv - Systems Biology 2020Quote: ... the silicon wafer was baked for 10 min at 200°C and spin coated at 4000 rpm using SU-8 2000.5 (MicroChem) to generate 0.5 μm height ...
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bioRxiv - Immunology 2021Quote: ... a master negative mold was prepared by spin-coating a silicon wafer with negative photoresist (SU-8, Microchem, MA) to a thickness of 100 μm ...
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bioRxiv - Cell Biology 2022Quote: ... a post-exposure baking identical to the soft bake was performed before development with SU-8 developer (Microchem, USA). Then ...
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bioRxiv - Microbiology 2023Quote: ... Molds were made on 100 mm silicon wafers (University Wafer) and spin coated with SU-8 3050 photoresist (MicroChem). Polydimethylsiloxane (PDMS ...
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bioRxiv - Genomics 2023Quote: ... The wafer was baked at 95 °C for 7 min and then rinsed with SU-8 developer (MicroChem, Y0201004000L1PE). The wafer was finally washed with isopropanol ...
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bioRxiv - Bioengineering 2023Quote: Molds for layer #3 and layer #5 (Figure S1d) are fabricated using SU-8 2075 (MicroChem, Newton, MA, USA) spin-coated at 2150rpm for 30s to create ∼100μm tall patterns (Figure S2a ...
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bioRxiv - Genetics 2024Quote: ... The manufacturer’s guidelines were followed to spin-coat SU-8-negative photoresist (nos. SU-2025 and SU-2010, Microchem) onto a silicon wafer (no ...
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bioRxiv - Biophysics 2024Quote: ... Control molds were composed of the following layers: (1) a ∼5 µm uniform layer of SU-8 2005 (Microchem) covering the entire wafer surface to improve feature adhesion (same bake times as above) ...
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bioRxiv - Biophysics 2024Quote: Flow molds were composed of the following layers: (1) a ∼5 µm uniform layer of SU-8 2005 (Microchem) covering the entire wafer surface to improve feature adhesion (soft bake at 65°C 2 min ...
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bioRxiv - Bioengineering 2020Quote: ... Negative master molds were fabricated on 3-in diameter silicon wafers (University Wafer ID: 447) using UV crosslinked Nano SU-8-100 photoresist (Microchem) patterned with photomasks printed on high-resolution transparent plastic film (CAD/Art Inc.) ...
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bioRxiv - Bioengineering 2020Quote: ... post-baked (65 °C and 95 °C for 1 min and 4 min, respectively) and developed in SU-8 developer (MicroChem). The SU-8 was hard-baked at 180 °C for 1 hour after development ...
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bioRxiv - Bioengineering 2021Quote: ... stamps for 250u and 500u diameter circles were prepared by polymerization upon a patterned master of photoresist (SU-8, MicroChem) created using UV photolithography using a laser printed mask ...
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bioRxiv - Cancer Biology 2021Quote: ... The conventional soft-lithography process was used to replicate the microchannel-patterned PDMS with SU-8 photoresist pattern master as a master mold (MicroChem). The PDMS elastomer ...
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bioRxiv - Synthetic Biology 2020Quote: ... using reactive ion etching to define 3.1 µm deep chambers arrayed along a 100 µm wide by 22 µm deep channel defined by SU-8 photoresist (MicroChem). After treating with a silane release layer ...
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bioRxiv - Bioengineering 2021Quote: ... The master molds were fabricated using SU-8 3050 photoresist spun to 124 – 136 μm thickness (Microchem, Westborough MA, USA) on 3” silicon wafers (University Wafer ...
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bioRxiv - Neuroscience 2022Quote: ... The wafer was inserted in the spin coater (WS-650-23NPP, Laurell) to deposit one layer of SU-8 2050 negative photoresist (Microchem) to obtain a thickness of 35 μm ...