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Citations for Microchem :
1 - 50 of 211 citations for 3 Acetoxy 8 17 13E Labdadien 15 Oic Acid since 2020
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Biophysics 2024Quote: ... and (3) a ∼15 µm layer of SU-8 2015 (Microchem) to generate square flow channels (let sit for 5 min ...
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bioRxiv - Neuroscience 2021Quote: ... (3) Spin-coating SU-8 precursor (SU-8 2000.5, MicroChem) at 3000 rpm ...
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bioRxiv - Biophysics 2021Quote: ... A 15-µm thick layer of SU-8 2015 (Microchem Corporation, 3300 rpm) was spun coated onto a 4-inch silicon wafer ...
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bioRxiv - Neuroscience 2024Quote: ... the transistors were insulated with a 3-µm-thick photodefinable SU-8 epoxy photoresist (SU-8 2005 Microchem), keeping uncovered the active area of the transistors channel ...
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bioRxiv - Bioengineering 2024Quote: ... a 3-inch wafer was coated with photoresist SU-8 3025 (Microchem) using a spin coater in a two-step process ...
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bioRxiv - Bioengineering 2022Quote: ... SU-8 based (SU-8 50 & SU-8 100, MicroChem, USA) wafer masters were fabricated according to the manufacturer’s protocols (media module ...
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bioRxiv - Neuroscience 2020Quote: ... SU-8 photoresist (SU-8 2000.5, MicroChem) was used to construct the bottom insulating layer ...
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bioRxiv - Genomics 2021Quote: ... SU-8 precursor (SU-8 2000.5, MicroChem) was spin-coated at 4000 rpm ...
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bioRxiv - Bioengineering 2022Quote: ... A negative photoresist of SU-8 (SU-8 2025 and SU-8 2050, MicroChem) and the chrome photomasks (Range Photomasks ...
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bioRxiv - Bioengineering 2023Quote: ... SU- 8 5 and SU-8 50 (MicroChem) were subsequently spin-coated on the wafer at different heights (5 µm for microchannels and 100 µm for microwells ...
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Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... The SU-8 precursor (SU-8 2000.5, MicroChem) was spin-coated to achieve a thickness of either 800 or 400 nm ...
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bioRxiv - Bioengineering 2023Quote: ... negative photoresist SU-8 (SU-8 2000.5; MicroChem) labeled with Lissamine rhodamine B ethylenediamine (RhBen ...
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bioRxiv - Bioengineering 2023Quote: ... negative photoresist SU-8 (SU-8 2010; MicroChem) was spin-coated on the Si wafer at 3,000 rpm for 30 s ...
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bioRxiv - Bioengineering 2023Quote: ... negative photoresist SU-8 (SU-8 2000.5; MicroChem) was spin-coated on the Si wafer at 3,000 rpm for 30 s ...
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bioRxiv - Bioengineering 2024Quote: ... the SU-8 precursor (SU-8 2025, MicroChem) was spin-coated ...
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bioRxiv - Bioengineering 2024Quote: ... SU-8 2002 (SU-8 2002; MicroChem Corp.) was used for insulation due to its excellent chemical and mechanical properties ...
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bioRxiv - Bioengineering 2024Quote: ... SU-8 2100 (MicroChem SU-8 2000 Series) was spin-coated ...
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bioRxiv - Bioengineering 2023Quote: Molds for layer #3 and layer #5 (Figure S1d) are fabricated using SU-8 2075 (MicroChem, Newton, MA, USA) spin-coated at 2150rpm for 30s to create ∼100μm tall patterns (Figure S2a ...
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bioRxiv - Bioengineering 2020Quote: ... Negative master molds were fabricated on 3-in diameter silicon wafers (University Wafer ID: 447) using UV crosslinked Nano SU-8-100 photoresist (Microchem) patterned with photomasks printed on high-resolution transparent plastic film (CAD/Art Inc.) ...
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bioRxiv - Neuroscience 2021Quote: ... (11) Spin-coating SU-8 precursor (SU-8 2025, MicroChem) at 3000 rpm ...
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bioRxiv - Neuroscience 2021Quote: ... (9) Spin-coating SU-8 precursor (SU-8 2025, MicroChem) at 4000 rpm ...
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bioRxiv - Bioengineering 2024Quote: ... a precursor SU-8 (specifically SU-8 2000.5 from MicroChem) was spin-coated onto the wafers at 4000 rpm ...
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bioRxiv - Bioengineering 2020Quote: ... A 0.5 μm thick SU-8 photoepoxy (SU-8 2000.5, Microchem) was then spin coated on the PET film ...
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bioRxiv - Bioengineering 2023Quote: ... The SU-8 resist was developed in SU-8 developer (Microchem), rinsed with isopropanol ...
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bioRxiv - Bioengineering 2023Quote: ... The SU-8 resist was developed in SU-8 developer (Microchem) for 3 min ...
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bioRxiv - Bioengineering 2023Quote: ... The SU-8 resist was developed in SU-8 developer (Microchem) for 1.5 min ...
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bioRxiv - Bioengineering 2020Quote: ... the non-polymerized SU-8 is removed with SU-8 developer (Microchem) in a bath for 10 min and then the wafer is cured in an oven at 160 °C.
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bioRxiv - Bioengineering 2023Quote: SU-8 2005 and SU-8 2010 photoresists were procured from Microchem Corporation (USA) ...
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bioRxiv - Biophysics 2021Quote: ... SU 8-3050 (MicroChem) photoresist was spin coated onto the silicon wafer at a specific rotation speed to obtain the desired thickness ...
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bioRxiv - Bioengineering 2020Quote: ... SU-8 2075 (Microchem) was spun coat onto the silicon wafer with a thickness of 120 μm ...
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bioRxiv - Bioengineering 2020Quote: ... We fabricated master molds in SU-8 (SU-8 3050, Microchem, Newton, MA) on 3-inch Si wafers (Silicon Sense ...
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bioRxiv - Biophysics 2023Quote: ... an insulating layer of 500 nm SU-8 (MicroChem Inc., SU-8 2000.5) was patterned by standard photolithography such that only the parallel bars of the microelectrodes were exposed for making contact with the solution ...
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bioRxiv - Bioengineering 2020Quote: ... SU-8 negative photoresist (MicroChem) was coated onto a 6” silicon wafer via spinning coating ...
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bioRxiv - Biochemistry 2020Quote: ... SU-8 2035 photoresist (Microchem) was spin-coated onto the wafer at 1055 rpm for 30 s to reach a desired thickness of 100 μm (± 3 μm) ...
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bioRxiv - Biophysics 2020Quote: ... using SU-8 photoresist (Microchem) on silicon masters (MicroChemicals) ...
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bioRxiv - Bioengineering 2022Quote: ... SU-8 2050 photoresist (MicroChem) was spun onto a silicon mold to achieve a 100 μm thick layer ...
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bioRxiv - Cancer Biology 2024Quote: ... SU-8 100 photoresist (Microchem) was spun on a 4 inch silicon wafer (University Wafers ...
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bioRxiv - Neuroscience 2023Quote: ... SU-8 2002 (MicroChem, USA) was spin-coated to achieve a thickness of approximately 3.0 µm (10 s at 500 rpm ...
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bioRxiv - Systems Biology 2023Quote: ... SU-8 3000 photoresist (MicroChem) was spun on a silicon wafer (University Wafers ...
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bioRxiv - Bioengineering 2024Quote: ... SU-8 2000.5 precursor (MicroChem) was spin-coated at 4000 rpm ...
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bioRxiv - Bioengineering 2024Quote: ... It was further baked at 95°C for 8 min and developed by submerging in SU-8 developer (Microchem SU-8 developer, Fisher Scientific) for at least 15 min ...
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bioRxiv - Bioengineering 2023Quote: ... It was further baked at 95°C for 8 min and developed by submerging in SU-8 developer (Microchem SU-8 developer, Fisher Scientific) for at least 15 min ...
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bioRxiv - Bioengineering 2020Quote: ... the device was encapsulated by a 7 μm thick SU-8 photoepoxy (SU-8 2007, Microchem) via photolithography.
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bioRxiv - Microbiology 2021Quote: Microfluidic devices for drop making were fabricated by patterning SU-8 photoresist (Microchem SU-8 50) on silicon wafers (University Wafer ...
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bioRxiv - Genomics 2020Quote: ... The negative photoresist SU-8 (SU-8 2025) based mold was fabricated according to manufacturer’s (MicroChem) recommendations using a precleaned silicon wafer substrate ...
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bioRxiv - Neuroscience 2021Quote: ... developed using SU-8 developer (MicroChem) for 6 min ...
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bioRxiv - Neuroscience 2021Quote: ... developed using SU-8 developer (MicroChem) for 60 s ...
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bioRxiv - Neuroscience 2021Quote: ... Photosensitive negative SU-8 resin (MicroChem) was spin-coated to the desired height on a silicon wafer (Prolog Semicor ...
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bioRxiv - Bioengineering 2020Quote: ... SU-8 photo resist (2100, MicroChem) was patterned on the Si wafer using standard photolithography procedure (Karl Suss MA6 Mask Aligner ...
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bioRxiv - Bioengineering 2020Quote: ... We used SU-8 2010 (Microchem) to achieve a feature depth of 12 μm using the protocol as written by the supplier and verified the height using profilometry ...