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Citations for Microchem :
101 - 150 of 210 citations for 8 Aminoguanine 13C2 15N since 2020
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Bioengineering 2020Quote: ... a 4-μm-thick layer of SU-8 2005 (MicroChem) was spin coated ...
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bioRxiv - Synthetic Biology 2022Quote: ... A first 40 µm layer of 3025 SU-8 (Microchem) containing the inner and middle phase channel was spincoated and UV exposed on the first half of the master while the second half was fully exposed ...
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bioRxiv - Synthetic Biology 2022Quote: ... A second 60 µm layer of 3050 SU-8 (Microchem) was spin-coated and UV exposed aligned on top of the features to generate the main channels on both halves of the master ...
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bioRxiv - Cancer Biology 2020Quote: ... Soft lithography was performed using SU-8 2050 photoresist (MicroChem) on 4” silicon substrate to obtain a feature aspect depth of 100 μm ...
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bioRxiv - Evolutionary Biology 2022Quote: ... a 20 μm thick layer of SU-8 3025 (Microchem) was deposited via spin coating (6,000 r.p.m ...
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bioRxiv - Biophysics 2023Quote: ... A second 50 μm thick layer (SU-8 3050, MicroChem) was then spin-coated onto the wafer and soft-baked for 15 min at 95 °C ...
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bioRxiv - Biophysics 2023Quote: ... A second 50 μm thick layer (SU-8 3050, MicroChem) was then spin-coated onto the wafer and soft-baked for 15 min at 95 °C ...
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bioRxiv - Bioengineering 2023Quote: ... silicon wafer masters possessing SU-8 photoresist (Microchem, Westborough, MA) were produced by standard photolithography and used to generate PDMS stamps ...
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bioRxiv - Neuroscience 2022Quote: A second layer of SU-8 2100 negative photoresist (Microchem) was spin-coated over the wafer to obtain a thickness of 250 μm ...
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bioRxiv - Bioengineering 2022Quote: ... Molds were created from SU-8 2100 photoresist (Microchem, Inc.) on a 4” silicon test-grade wafer (University Wafer ...
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bioRxiv - Biophysics 2022Quote: ... A second 50 μm thick layer (SU-8 3050, MicroChem) was then spin-coated onto the wafer and soft-baked for 15 min at 95 °C ...
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bioRxiv - Biochemistry 2024Quote: ... SU-8 developer was obtained from Microchem (Round Rock, USA). The photoresist IP-S was purchased from Nanoscribe GmbH (Eggenstein-Leopoldshafen ...
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bioRxiv - Cancer Biology 2020Quote: ... Masters were made using one layer of SU-8 photoresist (MicroChem). The depth of the two devices is 40+/-1μm to allow the droplet generating or flowing in a monolayer format ...
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bioRxiv - Bioengineering 2021Quote: ... SU-8 3010 and 3050 negative photoresist (MicroChem Corp., Newton, MA) were patterned onto separate silicon wafers to create two molds for the channel layer and microwell layer ...
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bioRxiv - Biophysics 2021Quote: ... A thin layer of SU-8 3010 photoresists (MicroChem, Newton, MA) was spin-coated onto a Si wafer and patterned via ultraviolet exposure through a chrome mask ...
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bioRxiv - Bioengineering 2020Quote: ... We spin a first layer of SU-8 2100 (MicroChem Corp.) to a thickness of 200 μm onto a wafer ...
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bioRxiv - Cancer Biology 2020Quote: ... the unhardened photoresist was dissolved in SU-8 developer (MicroChem Corp.), and the mold was rinsed with isopropanol (Wako ...
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bioRxiv - Microbiology 2023Quote: ... depositing a layer of SU-8 2150 (MicroChem Corp., Newton, MA) with controlled thickness (0.05 mm ...
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bioRxiv - Bioengineering 2024Quote: ... The positive mold of the SU-8 photoresist (Microchem, Westborough, MA) was fabricated using a photomask and a mask aligner (Xueze ...
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bioRxiv - Cell Biology 2023Quote: ... the resist is developed by immersion in SU-8 Developer (Microchem) for about 10 min ...
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bioRxiv - Cell Biology 2023Quote: ... we then spin-coat the first layer of SU-8 (Microchem): we use SU-8 3050 at 2700 rpm which after soft-baking for 20 min at 95 °C results in about 50 µm thickness ...
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bioRxiv - Biochemistry 2022Quote: ... silicon wafers were spin-coated with SU-8 2050 photoresist (Microchem) and patterned on exposure to ultraviolet light ...
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bioRxiv - Bioengineering 2022Quote: ... Photolithography was used to produce micropatterned SU-8 molds (MicroChem, USA). Cells were collected by trypsinization (0.05% Trypsin ...
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bioRxiv - Biophysics 2024Quote: ... and (3) a ∼15 µm layer of SU-8 2015 (Microchem) to generate square flow channels (let sit for 5 min ...
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bioRxiv - Biophysics 2024Quote: ... (2) a single ∼25 µm layer of SU-8 2025 (Microchem) (soft bake at 65°C 2 min ...
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bioRxiv - Bioengineering 2020Quote: ... The sample was developed for ~10 min in SU-8 developer (MicroChem) and then sprayed down with IPA and dried ...
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bioRxiv - Bioengineering 2021Quote: SU-8 2075 and PDMS (Sylgard 184) were purchased from MicroChem (USA) and Dow Corning (USA) ...
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bioRxiv - Bioengineering 2022Quote: ... Both wafers were developed in SU-8 developer (Microchem Corp, Newton, MA), rinsed in 100% isopropanol ...
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bioRxiv - Bioengineering 2022Quote: ... a 100 μm thick layer of SU-8 2100 negative photoresist (Microchem) was spun-coated (WS-650MZ-23NPP/LITE ...
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bioRxiv - Molecular Biology 2020Quote: ... All chips were fabricated by photolithographically defining SU8 (SU-8 2050, MicroChem) on silicon wafers at the Harvey Krueger Center of Nanotechnology at the Hebrew University of Jerusalem ...
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bioRxiv - Cell Biology 2024Quote: ... The patterned wafer was developed with the SU-8 developer (MicroChem, US) for 10 minutes ...
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bioRxiv - Bioengineering 2023Quote: ... a layer of negative photoresist (SU-8 2150, MicroChem, Newton, MA, USA) was spin-coated on top of a silicon wafer (Ø100 mm ...
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bioRxiv - Cell Biology 2023Quote: ... The undeveloped photoresist was removed by washing with SU-8 developer (Microchem) for 8 min ...
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bioRxiv - Bioengineering 2024Quote: ... a 3-inch wafer was coated with photoresist SU-8 3025 (Microchem) using a spin coater in a two-step process ...
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bioRxiv - Biophysics 2021Quote: ... Microchannel molds were prepared by depositing SU-8 2150 (MicroChem Corp., Newton, MA) on silicon wafers via photolithography ...
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bioRxiv - Bioengineering 2022Quote: ... Masters were made using one layer of SU-8 3050 photoresist (KAYAKU MICROCHEM). The depths of the droplet generator and micropillar array were 50.4 ± 2.1 μm and 87.6 ± 1.2 μm ...
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bioRxiv - Biophysics 2021Quote: ... A 15-µm thick layer of SU-8 2015 (Microchem Corporation, 3300 rpm) was spun coated onto a 4-inch silicon wafer ...
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bioRxiv - Bioengineering 2020Quote: ... a 65 μm thick layer of SU-8 2075 photoresist (MicroChem Corporation, USA) was photolithographically patterned on a 4-inch diameter and 500 μm thick silicon wafer (Wafer World Inc. ...
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bioRxiv - Neuroscience 2021Quote: ... All master molds were fabricated with transparency photomasks and SU-8 2075 (MicroChem). The master mold for the bottom Hydra layer (circular chambers ...
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bioRxiv - Bioengineering 2022Quote: ... Development of the master mold was done by a SU-8 developer (MicroChem) for 10 min and completed by washing with isopropanol and cleaning with an air gun ...
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bioRxiv - Immunology 2024Quote: ... the molds for the PDMS layers were made using SU-8 100 (Microchem), which were spin-coated onto wafers ...
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bioRxiv - Microbiology 2024Quote: ... Wafers were coated with SU-8 2010 photoresist (MicroChem Inc., Newton, MA, USA) to form film depositions ...
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bioRxiv - Biochemistry 2024Quote: ... SU-8 3050 (Kayaku Advances Materials) was poured onto a silicon wafer (MicroChem) and spun using a spincoater (Laurell Technologies ...
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bioRxiv - Bioengineering 2022Quote: ... The master molds for the PDMS layers were made using SU-8 100 (Microchem) which were spin-coated onto wafers ...
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bioRxiv - Cell Biology 2022Quote: ... we performed two cycles of spin-coating negative photoresist (SU-8, Microchem, Newton, MA) and exposure to ultraviolet (UV ...
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bioRxiv - Bioengineering 2020Quote: ... and (5) developing away uncured photoresist using SU-8 developer (Microchem Corp, Newton, MA) according to standard manufacturer instructions ...
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bioRxiv - Cell Biology 2021Quote: ... master molds were made by spin-coating SU-8 2005 resin (MicroChem Corp., USA) on silicon wafers using a spincoater (Laurell Technologies ...
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bioRxiv - Biophysics 2023Quote: ... created using ultraviolet (UV) photoresist lithography with SU-8 negative resist (SU8 3010, Microchem). The resists were then cured using UV light exposure through photomasks designed in CAD software and printed by CAD/Art Services ...
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bioRxiv - Genomics 2023Quote: ... A layer (∼30 μm in thickness) of SU-8 2025 photoresist (MicroChem, Y111069 0500L1GL) was coated on a 3-inch silicon wafer (University Wafer ...
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bioRxiv - Bioengineering 2023Quote: ... Mold for layer #4 is fabricated using SU-8 2025 (MicroChem, Newton, MA, USA) spin-coated at 4000rpm for 30s to create ∼20μm tall channels (Figure S2b) ...