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Citations for Microchem :
1 - 50 of 344 citations since 2020
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Microbiology 2024Quote: ... photoresist SU8-3035 (Microchem, USA) was spin coated onto a silicon wafer ...
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bioRxiv - Microbiology 2024Quote: The microfluidic device molds were created through lithography of SU8 (Microchem, Germany) on silicon wafers ...
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bioRxiv - Bioengineering 2024Quote: ... SU8 Photoresist (MicroChem, SU8 3025 and SU8 3050) were spin coated on three-inch silicon wafers (University Wafer) ...
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bioRxiv - Biophysics 2024Quote: ... SU8-3050 from MicroChem Corporation ...
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bioRxiv - Cancer Biology 2024Quote: ... SU-8 100 photoresist (Microchem) was spun on a 4 inch silicon wafer (University Wafers ...
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Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... followed by a standard lift-off procedure in remover PG (MicroChem) to define the interconnects ...
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Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... The SU-8 precursor (SU-8 2000.5, MicroChem) was spin-coated to achieve a thickness of either 800 or 400 nm ...
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Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... and the S1805 photoresist (MicroChem) was spin-coated at 4000 rpm ...
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Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... followed by a standard lift-off procedure in remover PG (MicroChem) to define the electrodes ...
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Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... the LOR3A photoresist (MicroChem) was spin-coated at 4000 rpm ...
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Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... developed using SU-8 developer (MicroChem) for 60 s ...
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bioRxiv - Bioengineering 2024Quote: ... It was further baked at 95°C for 8 min and developed by submerging in SU-8 developer (Microchem SU-8 developer, Fisher Scientific) for at least 15 min ...
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bioRxiv - Bioengineering 2024Quote: ... The positive mold of the SU-8 photoresist (Microchem, Westborough, MA) was fabricated using a photomask and a mask aligner (Xueze ...
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bioRxiv - Cell Biology 2024Quote: ... The patterned wafer was developed with the SU-8 developer (MicroChem, US) for 10 minutes ...
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bioRxiv - Cell Biology 2024Quote: The original microstructured silicon wafer was fabricated using photolithography by direct exposure of a layer of SU8 photoresist (MicroChem, USA) with a µPG machine (Heidelberg Instruments) ...
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bioRxiv - Cell Biology 2024Quote: A 4-inch silicon wafer (UniversityWafer, Inc., US) was first coated with an 80 µm-thick layer of photoresist (SU-8 2025, MicroChem, US) using a spin coater (spinNXG-P1 ...
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bioRxiv - Biophysics 2024Quote: Silicon wafers (Microchemicals GmbH, Ulm, Germany) were coated with SU-8 photoresist (Series 3005, MicroChem, Newton, USA) using a two-step spin-coating process ...
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bioRxiv - Bioengineering 2024Quote: ... A negative photoresist SU-2025 (MicroChem, MA, USA) and a film mask was used ...
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bioRxiv - Bioengineering 2024Quote: ... and developed with AZ400K (Microchem). Patterned wafers underwent deep reactive ion etching (SPTS Rapier DRIE) ...
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bioRxiv - Bioengineering 2024Quote: ... poly(methyl methacrylate) (PMMA 950 K A4, MicroChem) was spin-coated on an 1-inch silicon wafer at 3,000 rpm and baked at 180 °C for 3 min ...
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bioRxiv - Bioengineering 2024Quote: ... a spin-coating method was employed to apply hexamethyldisilazane (HMDS, MicroChem) at a speed of 4000 rotations per minute (rpm) ...
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bioRxiv - Bioengineering 2024Quote: ... the SU-8 precursor (SU-8 2025, MicroChem) was spin-coated ...
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bioRxiv - Bioengineering 2024Quote: ... a precursor SU-8 (specifically SU-8 2000.5 from MicroChem) was spin-coated onto the wafers at 4000 rpm ...
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bioRxiv - Bioengineering 2024Quote: ... a standard lift-off procedure was conducted in remover PG (MicroChem) for 2 hours ...
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bioRxiv - Bioengineering 2024Quote: ... The standard lift-off procedure in remover PG (MicroChem) was then conducted overnight to define the Cr/Au/Cr interconnects ...
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bioRxiv - Biochemistry 2024Quote: ... SU-8 developer was obtained from Microchem (Round Rock, USA). The photoresist IP-S was purchased from Nanoscribe GmbH (Eggenstein-Leopoldshafen ...
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bioRxiv - Immunology 2024Quote: ... any unpolymerized photoresist was dissolved using propylene glycol methyl ether acetate (PGMEA) (MicroChem). Polydimethylsiloxane (PDMS ...
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bioRxiv - Immunology 2024Quote: ... and the SU-8 2025 epoxy-based photoresist (MicroChem) was carefully poured onto it at 95 °C ...
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bioRxiv - Bioengineering 2024Quote: ... a 3-inch wafer was coated with photoresist SU-8 3025 (Microchem) using a spin coater in a two-step process ...
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bioRxiv - Bioengineering 2024Quote: ... LOR 3A and S1805 (MicroChem), were subsequently spin-coated onto the Si/SiO2 wafers at the speed of 4000 rpm and baked at 180°C for 5 minutes and at 115°C for 1 minute ...
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bioRxiv - Bioengineering 2024Quote: ... Silicon wafers were spin coated with AZ9260 (Microchem, thickness ≈ 6 μm), exposed using a contact aligner and chrome masks (ABM) ...
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bioRxiv - Bioengineering 2024Quote: ... the wafer was incubated in SU-8 developer (Microchem) for 10 minutes ...
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bioRxiv - Bioengineering 2024Quote: ... All photoresists and developers were obtained from MicroChem Corporation unless otherwise mentioned and used without further purification ...
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bioRxiv - Microbiology 2024Quote: ... Wafers were coated with SU-8 2010 photoresist (MicroChem Inc., Newton, MA, USA) to form film depositions ...
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bioRxiv - Bioengineering 2024Quote: ... a layer of SU-8 2002 (Microchem) was spin coated at 6000 rpm (ramp 500 rpm/s ...
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bioRxiv - Cell Biology 2024Quote: ... a first layer of Omnicoat (MicroChem) was deposited with a spincoater at 4000 rpm ...
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bioRxiv - Cell Biology 2024Quote: ... A layer of SU8-2050 resin (MicroChem) was then deposited with a spincoater at 2500 rpm and baked for 3’ at 65°C and 9’ at 95°C ...
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bioRxiv - Neuroscience 2024Quote: ... Negative photoresist SU-8 2150 (Microchem, USA) was spin-coated on a 4-inch silicon wafer (Semiconductor Wafer ...
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bioRxiv - Molecular Biology 2024Quote: ... purchased from Kayaku Advanced Materials (formerly Microchem, Westborough, MA, USA) and processed using the standard manufacturer’s guidelines ...
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bioRxiv - Biophysics 2024Quote: ... SU-8 developer solution (MicroChem, Newton, MA) was used to dissolve unexposed parts of the photoresist ...
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bioRxiv - Biophysics 2024Quote: ... Molds were fabricated by spin coating a layer of the negative photoresist SU-8 (MicroChem Newton, MA) (SU-8 3050 ...
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bioRxiv - Immunology 2024Quote: ... the molds for the PDMS layers were made using SU-8 100 (Microchem), which were spin-coated onto wafers ...
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bioRxiv - Bioengineering 2024Quote: ... SU-8 2002 (SU-8 2002; MicroChem Corp.) was used for insulation due to its excellent chemical and mechanical properties ...
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bioRxiv - Genetics 2024Quote: ... The manufacturer’s guidelines were followed to spin-coat SU-8-negative photoresist (nos. SU-2025 and SU-2010, Microchem) onto a silicon wafer (no ...
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bioRxiv - Biophysics 2024Quote: ... By spin-coating of SU-8 2002 (MicroChem) at 3000 rpm ...
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bioRxiv - Neuroscience 2024Quote: ... the transistors were insulated with a 3-µm-thick photodefinable SU-8 epoxy photoresist (SU-8 2005 Microchem), keeping uncovered the active area of the transistors channel ...
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bioRxiv - Bioengineering 2024Quote: ... followed by a standard lift-off procedure in remover PG (MicroChem). Next ...
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bioRxiv - Biochemistry 2024Quote: ... SU-8 3050 (Kayaku Advances Materials) was poured onto a silicon wafer (MicroChem) and spun using a spincoater (Laurell Technologies ...
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bioRxiv - Biophysics 2024Quote: ... SU8-3050 photoresist (Microchem) was poured onto a polished silicon wafer and spinned at 1500 rpm for 15 seconds and then 3000 rpm for 45 seconds ...
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bioRxiv - Biophysics 2024Quote: ... Control molds were composed of the following layers: (1) a ∼5 µm uniform layer of SU-8 2005 (Microchem) covering the entire wafer surface to improve feature adhesion (same bake times as above) ...