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Citations for Oxford Instruments :
1 - 7 of 7 citations for Ion Exchange Chromatography since 2019
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Bioengineering 2022Quote: ... Wafers were placed into a PlasmaPro 80 Reactive Ion Etcher (RIE) (Oxford Instrument – Abingdon, UK) to etch out the electrodes and connector array pads ...
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bioRxiv - Bioengineering 2022Quote: ... The final conical nanoneedle structure was obtained by reactive ion etching in an NGP80 (Oxford Instruments, UK) in the following conditions ...
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bioRxiv - Bioengineering 2022Quote: ... The photolithographic pattern is transferred into the silicon nitride layer by reactive ion etching (Oxford Instruments, NGP80) with the following parameters ...
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bioRxiv - Pathology 2021Quote: ... was fully etched to obtain strip waveguides of 250 nm height using an ion beam system (Ionfab 300+, Oxford Instruments) fed with argon at a flow rate of 6 SSCM ...
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bioRxiv - Bioengineering 2023Quote: ... The SiNx hardmask is then patterned with rows of perforations using a direct laser lithography system (MLA 150 Heidelberg) followed by reactive ion etching (RIE) using an inductively coupled plasma (ICP) ICP-RIE etcher (PlasmaPro System100, Oxford Instruments), leaving perforations of 1µm diameter exposing the Si device layer below ...
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bioRxiv - Neuroscience 2023Quote: ... The switched chemistry process also uses O2 but in a deep reactive ion etcher (DRIE) typically used for high aspect ratio etching of silicon (Oxford RIE-STS, Oxford Instruments, Abingdon, United Kingdom). In a two-step switched-chemistry process ...
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bioRxiv - Microbiology 2021Quote: The micromodels surface was etched to expose minerals embedded in the PDMS matrix (Fig. S2) using deep reactive ion etching (Plasmalab System 100, Oxford Instruments America Inc., Concord, MA) using a combination of sulfur hexafluoride (45 standard cm2/min ...