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Citations for Microchem :
1 - 29 of 29 citations for Mono 2 Ethyl 5 Carboxypentyl Phthalate Unlab. Dehp Metabolite V ;100 Ug Ml In Mtbe since 2019
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Neuroscience 2020Quote: ... and 2 µm S1818 (Microchem, 5000 rpm, baking at 100°C for 1 min). Patterns were developed for 40 – 50 s in MF319 (Microchem) ...
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bioRxiv - Cancer Biology 2024Quote: ... SU-8 100 photoresist (Microchem) was spun on a 4 inch silicon wafer (University Wafers ...
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bioRxiv - Plant Biology 2019Quote: ... SU-8 100 (MicroChem, Westborough, USA) negative photoresist was stacked on a silicon wafer using a spin coater ...
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bioRxiv - Bioengineering 2022Quote: ... Two SU-8 100 layers (MicroChem Corp) were coated on a microscope slide to achieve a thickness of 400 µm in height ...
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bioRxiv - Genetics 2021Quote: ... we spin-coated SU8-2 (MicroChem) on the wafer with the target height of 1.2 µm ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Bioengineering 2023Quote: ... SU- 8 5 and SU-8 50 (MicroChem) were subsequently spin-coated on the wafer at different heights (5 µm for microchannels and 100 µm for microwells ...
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bioRxiv - Bioengineering 2022Quote: ... SU-8 based (SU-8 50 & SU-8 100, MicroChem, USA) wafer masters were fabricated according to the manufacturer’s protocols (media module ...
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bioRxiv - Bioengineering 2022Quote: ... a 100 μm thick layer of SU-8 2100 negative photoresist (Microchem) was spun-coated (WS-650MZ-23NPP/LITE ...
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bioRxiv - Bioengineering 2021Quote: ... a 2-μm-thick SU8 encapsulation layer (SU8-2002, Microchem) was spin-coated onto the sample ...
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bioRxiv - Bioengineering 2022Quote: ... The master molds for the PDMS layers were made using SU-8 100 (Microchem) which were spin-coated onto wafers ...
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bioRxiv - Bioengineering 2020Quote: ... and (5) developing away uncured photoresist using SU-8 developer (Microchem Corp, Newton, MA) according to standard manufacturer instructions ...
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bioRxiv - Bioengineering 2023Quote: ... Negative master molds were made with Nano SU-8-100 photoresist (Microchem, Round Rock, TX, USA) on 3 silicon wafers (University Wafer Inc. ...
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bioRxiv - Cell Biology 2023Quote: ... Silicon wafers were coated with a first 5-μm layer of resin (SU8-3005; MicroChem; CTS) exposed to UV light at 23 mJ/cm2 (UV KUB2 ...
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bioRxiv - Genomics 2019Quote: ... and then microfluidic channel features were patterned with a 100 µm layer of SU-8 3050 (Microchem). Each chip was then capped with cured PDMS with holes cored for all inlet and outlet ports ...
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bioRxiv - Biochemistry 2021Quote: ... Undeveloped photoresist is washed off with SU-8 developer (1-methoxy-2-propanol acetate, MicroChem).
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bioRxiv - Microbiology 2023Quote: ... Molds were made on 100 mm silicon wafers (University Wafer) and spin coated with SU-8 3050 photoresist (MicroChem). Polydimethylsiloxane (PDMS ...
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bioRxiv - Bioengineering 2023Quote: Molds for layer #3 and layer #5 (Figure S1d) are fabricated using SU-8 2075 (MicroChem, Newton, MA, USA) spin-coated at 2150rpm for 30s to create ∼100μm tall patterns (Figure S2a ...
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bioRxiv - Bioengineering 2020Quote: ... Negative master molds were fabricated on 3-in diameter silicon wafers (University Wafer ID: 447) using UV crosslinked Nano SU-8-100 photoresist (Microchem) patterned with photomasks printed on high-resolution transparent plastic film (CAD/Art Inc.) ...
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bioRxiv - Synthetic Biology 2020Quote: ... using reactive ion etching to define 3.1 µm deep chambers arrayed along a 100 µm wide by 22 µm deep channel defined by SU-8 photoresist (MicroChem). After treating with a silane release layer ...
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bioRxiv - Genomics 2021Quote: ... Sharon Thermal Evaporator was used for the deposition of 100-nm-thick Ni followed by a standard lift-off procedure in remover PG (MicroChem) for 2 hours ...
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bioRxiv - Biophysics 2021Quote: ... followed by Pt/Ti (20 nm/5 nm) deposition with e-beam (Angstrom Engineering) and lift off using remover PG (MicroChem). To remove photoresist residues and improve the adhesion of electrodes ...
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bioRxiv - Microbiology 2020Quote: ... and laser mask writer (Heidelberg Instruments) followed by Au/Cr (45 nm/5 nm) deposition and lift off using remover PG (MicroChem). After that the graphene patterning was done with lithography using same bilayer resist and oxygen plasma etching ...
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bioRxiv - Bioengineering 2023Quote: ... and O2 plasma treated (Harrick Plasma) for 2 min prior to coating with SU-8 photoresist (MicroChem, Kayaku) using a spin-coater ...
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bioRxiv - Bioengineering 2020Quote: Microfluidic devices for making 50 μm and 100 μm diameter drops were fabricated by patterning SU-8 photoresist (Microchem SU-8 3050) on silicon wafers (University Wafer ...
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bioRxiv - Bioengineering 2023Quote: ... with 500×500 µm2 surface area is detached from the Si host substrate using a polydimethylsiloxane (PDMS, Sylgard 184, DOW Chemical) stamp covered with a 2 µm-thin polymethyl methacrylate (PMMA, MicroChem) layer (Fig.S5A ...
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bioRxiv - Neuroscience 2022Quote: ... cleaned wafers were spin-coated with 1 ml/inch SU8-50 (MicroChem, Newton Massachusetts, USA) to obtain a 30-micron height (500 RPM (100 RPM/s acceleration for 15 seconds) ...
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bioRxiv - Bioengineering 2021Quote: ... by UV (365nm with 11.1mW/cm2) exposure (UV-KUB 2, KLOE, France) of a 75 μm thick layer of SU-8 2075 photoresist (MicroChem Corporation, USA) for 20s ...