Labshake search
Citations for Microchem :
1 - 9 of 9 citations for MBL 2 Mouse HEK293 since 2019
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Genetics 2021Quote: ... we spin-coated SU8-2 (MicroChem) on the wafer with the target height of 1.2 µm ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Bioengineering 2021Quote: ... a 2-μm-thick SU8 encapsulation layer (SU8-2002, Microchem) was spin-coated onto the sample ...
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bioRxiv - Neuroscience 2020Quote: ... and 2 µm S1818 (Microchem, 5000 rpm, baking at 100°C for 1 min). Patterns were developed for 40 – 50 s in MF319 (Microchem) ...
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bioRxiv - Biochemistry 2021Quote: ... Undeveloped photoresist is washed off with SU-8 developer (1-methoxy-2-propanol acetate, MicroChem).
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bioRxiv - Bioengineering 2023Quote: ... and O2 plasma treated (Harrick Plasma) for 2 min prior to coating with SU-8 photoresist (MicroChem, Kayaku) using a spin-coater ...
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bioRxiv - Bioengineering 2023Quote: ... with 500×500 µm2 surface area is detached from the Si host substrate using a polydimethylsiloxane (PDMS, Sylgard 184, DOW Chemical) stamp covered with a 2 µm-thin polymethyl methacrylate (PMMA, MicroChem) layer (Fig.S5A ...
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bioRxiv - Bioengineering 2021Quote: ... by UV (365nm with 11.1mW/cm2) exposure (UV-KUB 2, KLOE, France) of a 75 μm thick layer of SU-8 2075 photoresist (MicroChem Corporation, USA) for 20s ...