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Citations for Microchem :
1 - 9 of 9 citations for 6 amino 7H benzo e perimidin 7 one since 2019
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Bioengineering 2022Quote: ... A 7 μm thick SU-8 2007 (MicroChem Corp.) was spin coated on the PET film at 3,000 rpm for 40 s ...
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bioRxiv - Genomics 2022Quote: ... One layer of photoresist (Microchem, SU-8 2075) is spun onto a silicon wafer at a thickness of 100 μm ...
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bioRxiv - Developmental Biology 2021Quote: ... One layer of photoresist (SU-8 2075, Microchem) is spun onto a silicon wafer at a thickness of 110μm ...
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bioRxiv - Cancer Biology 2020Quote: ... Masters were made using one layer of SU-8 photoresist (MicroChem). The depth of the two devices is 40+/-1μm to allow the droplet generating or flowing in a monolayer format ...
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bioRxiv - Bioengineering 2022Quote: ... Masters were made using one layer of SU-8 3050 photoresist (KAYAKU MICROCHEM). The depths of the droplet generator and micropillar array were 50.4 ± 2.1 μm and 87.6 ± 1.2 μm ...
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bioRxiv - Bioengineering 2020Quote: ... the device was encapsulated by a 7 μm thick SU-8 photoepoxy (SU-8 2007, Microchem) via photolithography.
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bioRxiv - Biophysics 2021Quote: ... followed by Pt/Ti (20 nm/5 nm) deposition with e-beam (Angstrom Engineering) and lift off using remover PG (MicroChem). To remove photoresist residues and improve the adhesion of electrodes ...
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bioRxiv - Genomics 2023Quote: ... The wafer was baked at 95 °C for 7 min and then rinsed with SU-8 developer (MicroChem, Y0201004000L1PE). The wafer was finally washed with isopropanol ...
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bioRxiv - Neuroscience 2022Quote: ... The wafer was inserted in the spin coater (WS-650-23NPP, Laurell) to deposit one layer of SU-8 2050 negative photoresist (Microchem) to obtain a thickness of 35 μm ...