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Citations for Microchem :
1 - 22 of 22 citations for 6 METHOXY 1 3 BENZODIOXOL 5 AMINE since 2019
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Biochemistry 2021Quote: ... Undeveloped photoresist is washed off with SU-8 developer (1-methoxy-2-propanol acetate, MicroChem).
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bioRxiv - Bioengineering 2023Quote: Molds for layer #3 and layer #5 (Figure S1d) are fabricated using SU-8 2075 (MicroChem, Newton, MA, USA) spin-coated at 2150rpm for 30s to create ∼100μm tall patterns (Figure S2a ...
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bioRxiv - Neuroscience 2021Quote: ... (3) Spin-coating SU-8 precursor (SU-8 2000.5, MicroChem) at 3000 rpm ...
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bioRxiv - Bioengineering 2023Quote: ... SU- 8 5 and SU-8 50 (MicroChem) were subsequently spin-coated on the wafer at different heights (5 µm for microchannels and 100 µm for microwells ...
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bioRxiv - Bioengineering 2020Quote: ... and (5) developing away uncured photoresist using SU-8 developer (Microchem Corp, Newton, MA) according to standard manufacturer instructions ...
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bioRxiv - Bioengineering 2020Quote: ... Negative master molds were fabricated on 3-in diameter silicon wafers (University Wafer ID: 447) using UV crosslinked Nano SU-8-100 photoresist (Microchem) patterned with photomasks printed on high-resolution transparent plastic film (CAD/Art Inc.) ...
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bioRxiv - Cell Biology 2023Quote: ... Silicon wafers were coated with a first 5-μm layer of resin (SU8-3005; MicroChem; CTS) exposed to UV light at 23 mJ/cm2 (UV KUB2 ...
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bioRxiv - Biophysics 2021Quote: ... followed by Pt/Ti (20 nm/5 nm) deposition with e-beam (Angstrom Engineering) and lift off using remover PG (MicroChem). To remove photoresist residues and improve the adhesion of electrodes ...
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bioRxiv - Microbiology 2020Quote: ... and laser mask writer (Heidelberg Instruments) followed by Au/Cr (45 nm/5 nm) deposition and lift off using remover PG (MicroChem). After that the graphene patterning was done with lithography using same bilayer resist and oxygen plasma etching ...
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bioRxiv - Neuroscience 2020Quote: ... and 2 µm S1818 (Microchem, 5000 rpm, baking at 100°C for 1 min). Patterns were developed for 40 – 50 s in MF319 (Microchem) ...
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bioRxiv - Neuroscience 2021Quote: ... and 1 min at 65 °C) before developing the wafer in SU8 developer (MicroChem, USA). The wafer was finally rinsed with isopropanol ...
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bioRxiv - Neuroscience 2022Quote: ... cleaned wafers were spin-coated with 1 ml/inch SU8-50 (MicroChem, Newton Massachusetts, USA) to obtain a 30-micron height (500 RPM (100 RPM/s acceleration for 15 seconds) ...
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bioRxiv - Neuroscience 2021Quote: ... and 1 min at 65 °C) before developing the wafer in SU8 developer (MicroChem, USA). The wafer was finally rinsed with isopropanol ...
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bioRxiv - Bioengineering 2020Quote: ... on top of which a trace layer was shaped using S-1818 (MicroChem, 115 °C, 1 min). Prior to sputtering deposition ...
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bioRxiv - Bioengineering 2020Quote: ... post-baked (65 °C and 95 °C for 1 min and 4 min, respectively) and developed in SU-8 developer (MicroChem). The SU-8 was hard-baked at 180 °C for 1 hour after development ...
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bioRxiv - Bioengineering 2022Quote: The procedures to fabricate the NOMA microchip are as follows: 1) Fabrication of the hard molds for microwells by patterning SU8-3035 (Microchem) on silicon wafers with photolithography ...
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bioRxiv - Bioengineering 2019Quote: ... at a ratio of 10:1 base to curing agent was cast against a mold composed of SU-8 2150 (MicroChem) patterns formed on a silicon wafer ...
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bioRxiv - Bioengineering 2023Quote: ... PDMS mixture (10:1 elastomer base to curing agent, w/w) was degassed and poured onto SU-8 (MicroChem, MA, USA) patterned wafer and cured at 80°C for 1 h ...
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bioRxiv - Microbiology 2022Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Microbiology 2022Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Microbiology 2023Quote: ... at a base-to-curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Microbiology 2023Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...