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Citations for Microchem :
1 - 18 of 18 citations for 6 Chloro 9 fluorobenz 9 isoquinoline 5 10 dione since 2019
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Neuroscience 2021Quote: ... (9) Spin-coating SU-8 precursor (SU-8 2025, MicroChem) at 4000 rpm ...
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bioRxiv - Bioengineering 2023Quote: ... SU- 8 5 and SU-8 50 (MicroChem) were subsequently spin-coated on the wafer at different heights (5 µm for microchannels and 100 µm for microwells ...
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bioRxiv - Bioengineering 2022Quote: ... SU8-10 and SU8-2010 were purchased from MicroChem. Biotin-coated polystyrene beads (Cat#TPX-150-5 ...
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bioRxiv - Bioengineering 2020Quote: ... and (5) developing away uncured photoresist using SU-8 developer (Microchem Corp, Newton, MA) according to standard manufacturer instructions ...
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bioRxiv - Bioengineering 2020Quote: ... The sample was developed for ~10 min in SU-8 developer (MicroChem) and then sprayed down with IPA and dried ...
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bioRxiv - Cell Biology 2023Quote: ... Silicon wafers were coated with a first 5-μm layer of resin (SU8-3005; MicroChem; CTS) exposed to UV light at 23 mJ/cm2 (UV KUB2 ...
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bioRxiv - Bioengineering 2023Quote: Molds for layer #3 and layer #5 (Figure S1d) are fabricated using SU-8 2075 (MicroChem, Newton, MA, USA) spin-coated at 2150rpm for 30s to create ∼100μm tall patterns (Figure S2a ...
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bioRxiv - Biophysics 2021Quote: ... followed by Pt/Ti (20 nm/5 nm) deposition with e-beam (Angstrom Engineering) and lift off using remover PG (MicroChem). To remove photoresist residues and improve the adhesion of electrodes ...
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bioRxiv - Microbiology 2020Quote: ... and laser mask writer (Heidelberg Instruments) followed by Au/Cr (45 nm/5 nm) deposition and lift off using remover PG (MicroChem). After that the graphene patterning was done with lithography using same bilayer resist and oxygen plasma etching ...
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bioRxiv - Systems Biology 2020Quote: ... the silicon wafer was baked for 10 min at 200°C and spin coated at 4000 rpm using SU-8 2000.5 (MicroChem) to generate 0.5 μm height ...
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bioRxiv - Biophysics 2020Quote: A 4-inch silicon wafer was structured with a first SU8-3010 layer of 10 μm and a second SU8-3050 layer of 50 μm (both MicroChem), according to manufacturer instructions using a μPG101 exposure system (Heidelberg Instruments ...
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bioRxiv - Bioengineering 2019Quote: ... at a ratio of 10:1 base to curing agent was cast against a mold composed of SU-8 2150 (MicroChem) patterns formed on a silicon wafer ...
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bioRxiv - Bioengineering 2023Quote: ... PDMS mixture (10:1 elastomer base to curing agent, w/w) was degassed and poured onto SU-8 (MicroChem, MA, USA) patterned wafer and cured at 80°C for 1 h ...
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bioRxiv - Microbiology 2022Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Microbiology 2022Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Microbiology 2023Quote: ... at a base-to-curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Microbiology 2023Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Neuroscience 2020Quote: ... the bottom Ag anode was structured via photolithography using a spin-coated bi-layer photoresist of 660 nm LOR7B (Microchem, 3000 rpm, baking at 180°C for 10 min) and 2 µm S1818 (Microchem ...