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Citations for Microchem :
1 - 25 of 25 citations for 6 Amino 5 chloro 2 cyclopropyl 4 pyrimidinecarboxylic acid since 2019
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Neuroscience 2021Quote: ... (4) Spin-coating LOR3A photoresist (MicroChem) at 4000 rpm ...
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bioRxiv - Genetics 2021Quote: ... we spin-coated SU8-2 (MicroChem) on the wafer with the target height of 1.2 µm ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Bioengineering 2023Quote: ... SU- 8 5 and SU-8 50 (MicroChem) were subsequently spin-coated on the wafer at different heights (5 µm for microchannels and 100 µm for microwells ...
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bioRxiv - Bioengineering 2020Quote: ... a 4-μm-thick layer of SU-8 2005 (MicroChem) was spin coated ...
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bioRxiv - Biophysics 2023Quote: A Piranha cleaned 4” Silicon wafer was spin coated with SU-2035 (Microchem) negative photoresist at 3000 rpm for 35 seconds to obtain a thickness of 75µm ...
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bioRxiv - Bioengineering 2021Quote: ... a 2-μm-thick SU8 encapsulation layer (SU8-2002, Microchem) was spin-coated onto the sample ...
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bioRxiv - Bioengineering 2023Quote: ... Mold for layer #4 is fabricated using SU-8 2025 (MicroChem, Newton, MA, USA) spin-coated at 4000rpm for 30s to create ∼20μm tall channels (Figure S2b) ...
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bioRxiv - Bioengineering 2020Quote: ... and (5) developing away uncured photoresist using SU-8 developer (Microchem Corp, Newton, MA) according to standard manufacturer instructions ...
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bioRxiv - Cell Biology 2019Quote: ... Control molds were fabricated on 4” silicon wafers by spin coating SU-8 2025/3025 (MicroChem) at 500 rpm for 5 sec followed by 3000 rpm for 70 sec yielding a substrate height of around 15-18 μm ...
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bioRxiv - Genomics 2021Quote: ... The SU-8 lithography is performed on a 4 inch silicon wafer using SU 8-2050 (Microchem) negative photoresist using UV aligner (EVG-620) ...
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bioRxiv - Cell Biology 2023Quote: ... Silicon wafers were coated with a first 5-μm layer of resin (SU8-3005; MicroChem; CTS) exposed to UV light at 23 mJ/cm2 (UV KUB2 ...
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bioRxiv - Neuroscience 2020Quote: ... and 2 µm S1818 (Microchem, 5000 rpm, baking at 100°C for 1 min). Patterns were developed for 40 – 50 s in MF319 (Microchem) ...
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bioRxiv - Biochemistry 2021Quote: ... Undeveloped photoresist is washed off with SU-8 developer (1-methoxy-2-propanol acetate, MicroChem).
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bioRxiv - Systems Biology 2019Quote: ... The master was subjected to post-exposure bake at 95°C for 4 min and developed in fresh SU-8 developer (Microchem) for 6 min ...
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bioRxiv - Bioengineering 2020Quote: ... post-baked (65 °C and 95 °C for 1 min and 4 min, respectively) and developed in SU-8 developer (MicroChem). The SU-8 was hard-baked at 180 °C for 1 hour after development ...
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bioRxiv - Synthetic Biology 2019Quote: Master moulds of 13μm height were produced on a 4 inch silicone wafer (University Wafer) using SU-8 3010 (Microchem corp.) according to the manufacturer’s data sheet and developed in PGMEA ...
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bioRxiv - Bioengineering 2023Quote: Molds for layer #3 and layer #5 (Figure S1d) are fabricated using SU-8 2075 (MicroChem, Newton, MA, USA) spin-coated at 2150rpm for 30s to create ∼100μm tall patterns (Figure S2a ...
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bioRxiv - Biophysics 2021Quote: ... followed by Pt/Ti (20 nm/5 nm) deposition with e-beam (Angstrom Engineering) and lift off using remover PG (MicroChem). To remove photoresist residues and improve the adhesion of electrodes ...
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bioRxiv - Microbiology 2020Quote: ... and laser mask writer (Heidelberg Instruments) followed by Au/Cr (45 nm/5 nm) deposition and lift off using remover PG (MicroChem). After that the graphene patterning was done with lithography using same bilayer resist and oxygen plasma etching ...
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bioRxiv - Bioengineering 2023Quote: ... and O2 plasma treated (Harrick Plasma) for 2 min prior to coating with SU-8 photoresist (MicroChem, Kayaku) using a spin-coater ...
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bioRxiv - Evolutionary Biology 2022Quote: ... The chip mould with a uniform height of 23.5μm was obtained by spin-coating a silicon wafer (4 inches; Siltronix, France) with a negative photoresist (SU-8 2035, MicroChem Corp., Newton, MA, USA) according to manufacturer’s instructions ...
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bioRxiv - Bioengineering 2023Quote: ... with 500×500 µm2 surface area is detached from the Si host substrate using a polydimethylsiloxane (PDMS, Sylgard 184, DOW Chemical) stamp covered with a 2 µm-thin polymethyl methacrylate (PMMA, MicroChem) layer (Fig.S5A ...
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bioRxiv - Bioengineering 2021Quote: ... by UV (365nm with 11.1mW/cm2) exposure (UV-KUB 2, KLOE, France) of a 75 μm thick layer of SU-8 2075 photoresist (MicroChem Corporation, USA) for 20s ...