Hafnium Oxide:Yttrium Oxide Sputtering Target

Supplier Alfa Chemistry
Product # ACMA00020791
CAS #
Pricing Inquire
Application high purity Hafnium Oxide:Yttrium Oxide Sputtering Targets with the highest possible density High Purity (99.99%) Hafnium Oxide:Yttrium Oxide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
MolecularFormula HfO2 • Y2O3
Feedback