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Citations for Microchem :
1 - 50 of 238 citations for 8 Chloro 4 methyl 1 2 dihydroquinolin 2 one since 2019
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Biochemistry 2021Quote: ... Undeveloped photoresist is washed off with SU-8 developer (1-methoxy-2-propanol acetate, MicroChem).
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bioRxiv - Genomics 2022Quote: ... One layer of photoresist (Microchem, SU-8 2075) is spun onto a silicon wafer at a thickness of 100 μm ...
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bioRxiv - Developmental Biology 2021Quote: ... One layer of photoresist (SU-8 2075, Microchem) is spun onto a silicon wafer at a thickness of 110μm ...
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bioRxiv - Bioengineering 2022Quote: ... After baking and developing with SU-8 developer (propylene glycol methyl ether acetate; MicroChem Corp.), the 10-μm tall positive master of the drop-maker and the 25-μm tall positive master of the sorter are formed on the silicon wafers ...
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bioRxiv - Bioengineering 2022Quote: ... After baking and development with SU-8 developer (propylene glycol methyl ether acetate; MicroChem Corp.), the 15 μm and 25 μm tall positive masters of the devices were formed on the silicon wafers ...
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bioRxiv - Bioengineering 2022Quote: ... After baking and development with SU-8 developer (propylene glycol methyl ether acetate; MicroChem Corp.), a 10-μm tall positive master of the device was formed on the silicon wafer ...
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bioRxiv - Cancer Biology 2020Quote: ... Masters were made using one layer of SU-8 photoresist (MicroChem). The depth of the two devices is 40+/-1μm to allow the droplet generating or flowing in a monolayer format ...
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bioRxiv - Bioengineering 2022Quote: ... Masters were made using one layer of SU-8 3050 photoresist (KAYAKU MICROCHEM). The depths of the droplet generator and micropillar array were 50.4 ± 2.1 μm and 87.6 ± 1.2 μm ...
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bioRxiv - Bioengineering 2023Quote: ... and O2 plasma treated (Harrick Plasma) for 2 min prior to coating with SU-8 photoresist (MicroChem, Kayaku) using a spin-coater ...
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bioRxiv - Bioengineering 2020Quote: ... a 4-μm-thick layer of SU-8 2005 (MicroChem) was spin coated ...
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bioRxiv - Genomics 2021Quote: ... The SU-8 lithography is performed on a 4 inch silicon wafer using SU 8-2050 (Microchem) negative photoresist using UV aligner (EVG-620) ...
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bioRxiv - Bioengineering 2021Quote: ... by UV (365nm with 11.1mW/cm2) exposure (UV-KUB 2, KLOE, France) of a 75 μm thick layer of SU-8 2075 photoresist (MicroChem Corporation, USA) for 20s ...
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bioRxiv - Bioengineering 2020Quote: ... post-baked (65 °C and 95 °C for 1 min and 4 min, respectively) and developed in SU-8 developer (MicroChem). The SU-8 was hard-baked at 180 °C for 1 hour after development ...
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bioRxiv - Genetics 2021Quote: ... we spin-coated SU8-2 (MicroChem) on the wafer with the target height of 1.2 µm ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Neuroscience 2020Quote: ... and 2 µm S1818 (Microchem, 5000 rpm, baking at 100°C for 1 min). Patterns were developed for 40 – 50 s in MF319 (Microchem) ...
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bioRxiv - Bioengineering 2023Quote: ... Mold for layer #4 is fabricated using SU-8 2025 (MicroChem, Newton, MA, USA) spin-coated at 4000rpm for 30s to create ∼20μm tall channels (Figure S2b) ...
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bioRxiv - Neuroscience 2022Quote: ... The wafer was inserted in the spin coater (WS-650-23NPP, Laurell) to deposit one layer of SU-8 2050 negative photoresist (Microchem) to obtain a thickness of 35 μm ...
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bioRxiv - Bioengineering 2022Quote: ... SU-8 based (SU-8 50 & SU-8 100, MicroChem, USA) wafer masters were fabricated according to the manufacturer’s protocols (media module ...
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bioRxiv - Cell Biology 2019Quote: ... Control molds were fabricated on 4” silicon wafers by spin coating SU-8 2025/3025 (MicroChem) at 500 rpm for 5 sec followed by 3000 rpm for 70 sec yielding a substrate height of around 15-18 μm ...
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bioRxiv - Neuroscience 2020Quote: ... SU-8 photoresist (SU-8 2000.5, MicroChem) was used to construct the bottom insulating layer ...
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bioRxiv - Genomics 2021Quote: ... SU-8 precursor (SU-8 2000.5, MicroChem) was spin-coated at 4000 rpm ...
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bioRxiv - Bioengineering 2022Quote: ... A negative photoresist of SU-8 (SU-8 2025 and SU-8 2050, MicroChem) and the chrome photomasks (Range Photomasks ...
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bioRxiv - Genomics 2019Quote: ... SU-8 2025 and SU-8 2010 (MicroChem) were used sequentially ...
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bioRxiv - Bioengineering 2023Quote: ... SU- 8 5 and SU-8 50 (MicroChem) were subsequently spin-coated on the wafer at different heights (5 µm for microchannels and 100 µm for microwells ...
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bioRxiv - Bioengineering 2023Quote: ... negative photoresist SU-8 (SU-8 2010; MicroChem) was spin-coated on the Si wafer at 3,000 rpm for 30 s ...
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bioRxiv - Bioengineering 2023Quote: ... negative photoresist SU-8 (SU-8 2000.5; MicroChem) was spin-coated on the Si wafer at 3,000 rpm for 30 s ...
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bioRxiv - Bioengineering 2023Quote: ... negative photoresist SU-8 (SU-8 2000.5; MicroChem) labeled with Lissamine rhodamine B ethylenediamine (RhBen ...
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Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... The SU-8 precursor (SU-8 2000.5, MicroChem) was spin-coated to achieve a thickness of either 800 or 400 nm ...
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bioRxiv - Plant Biology 2019Quote: ... we fabricated SU-8 masters (SU-8 2050, Microchem) on silicon wafers using a Karl-Süss MJB4 mask aligner and a laser printed photomask (Selba ...
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bioRxiv - Neuroscience 2021Quote: ... (11) Spin-coating SU-8 precursor (SU-8 2025, MicroChem) at 3000 rpm ...
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bioRxiv - Neuroscience 2021Quote: ... (9) Spin-coating SU-8 precursor (SU-8 2025, MicroChem) at 4000 rpm ...
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bioRxiv - Neuroscience 2021Quote: ... (3) Spin-coating SU-8 precursor (SU-8 2000.5, MicroChem) at 3000 rpm ...
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bioRxiv - Bioengineering 2019Quote: ... Uncrosslinked SU-8 was removed with SU-8 developer (Microchem) and silicon wafers were treated by vapor phase deposition of trichloro (1H ...
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bioRxiv - Bioengineering 2021Quote: ... a 2-μm-thick SU8 encapsulation layer (SU8-2002, Microchem) was spin-coated onto the sample ...
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bioRxiv - Bioengineering 2020Quote: ... A 0.5 μm thick SU-8 photoepoxy (SU-8 2000.5, Microchem) was then spin coated on the PET film ...
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bioRxiv - Bioengineering 2023Quote: ... The SU-8 resist was developed in SU-8 developer (Microchem) for 3 min ...
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bioRxiv - Bioengineering 2023Quote: ... The SU-8 resist was developed in SU-8 developer (Microchem) for 1.5 min ...
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bioRxiv - Bioengineering 2023Quote: ... The SU-8 resist was developed in SU-8 developer (Microchem), rinsed with isopropanol ...
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bioRxiv - Systems Biology 2019Quote: ... The master was subjected to post-exposure bake at 95°C for 4 min and developed in fresh SU-8 developer (Microchem) for 6 min ...
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bioRxiv - Synthetic Biology 2019Quote: Master moulds of 13μm height were produced on a 4 inch silicone wafer (University Wafer) using SU-8 3010 (Microchem corp.) according to the manufacturer’s data sheet and developed in PGMEA ...
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bioRxiv - Microbiology 2022Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Microbiology 2022Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Microbiology 2023Quote: ... at a base-to-curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Microbiology 2023Quote: ... at a base to curing agent ratio of 10:1 was cast against a mold composed of SU-8 2150 (MicroChem, Cat# SU-8 2150) patterns formed on a silicon wafer ...
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bioRxiv - Bioengineering 2020Quote: ... the non-polymerized SU-8 is removed with SU-8 developer (Microchem) in a bath for 10 min and then the wafer is cured in an oven at 160 °C.
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bioRxiv - Bioengineering 2023Quote: SU-8 2005 and SU-8 2010 photoresists were procured from Microchem Corporation (USA) ...
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bioRxiv - Biophysics 2021Quote: ... SU 8-3050 (MicroChem) photoresist was spin coated onto the silicon wafer at a specific rotation speed to obtain the desired thickness ...
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bioRxiv - Bioengineering 2020Quote: ... SU-8 2075 (Microchem) was spun coat onto the silicon wafer with a thickness of 120 μm ...