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Citations for Microchem :
1 - 50 of 233 citations for 6 METHOXY 2 5 7 8 TETRAMETHYL CHROMAN 2 CARBOXYLIC ACID since 2019
Citations are collected from bioRxiv only, the total number of publications could be much larger.
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bioRxiv - Biochemistry 2021Quote: ... Undeveloped photoresist is washed off with SU-8 developer (1-methoxy-2-propanol acetate, MicroChem).
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bioRxiv - Bioengineering 2022Quote: ... A 7 μm thick SU-8 2007 (MicroChem Corp.) was spin coated on the PET film at 3,000 rpm for 40 s ...
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bioRxiv - Bioengineering 2023Quote: ... SU- 8 5 and SU-8 50 (MicroChem) were subsequently spin-coated on the wafer at different heights (5 µm for microchannels and 100 µm for microwells ...
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bioRxiv - Bioengineering 2020Quote: ... the device was encapsulated by a 7 μm thick SU-8 photoepoxy (SU-8 2007, Microchem) via photolithography.
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bioRxiv - Bioengineering 2023Quote: ... and O2 plasma treated (Harrick Plasma) for 2 min prior to coating with SU-8 photoresist (MicroChem, Kayaku) using a spin-coater ...
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bioRxiv - Bioengineering 2021Quote: ... by UV (365nm with 11.1mW/cm2) exposure (UV-KUB 2, KLOE, France) of a 75 μm thick layer of SU-8 2075 photoresist (MicroChem Corporation, USA) for 20s ...
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bioRxiv - Genomics 2023Quote: ... The wafer was baked at 95 °C for 7 min and then rinsed with SU-8 developer (MicroChem, Y0201004000L1PE). The wafer was finally washed with isopropanol ...
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bioRxiv - Genetics 2021Quote: ... we spin-coated SU8-2 (MicroChem) on the wafer with the target height of 1.2 µm ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Bioengineering 2023Quote: ... (2) LOR 3A and S1805 (Microchem) were spin-coated at 4,000 rpm for 45 s and baked at 180 °C for 4 min and at 115 °C for 1 min ...
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bioRxiv - Bioengineering 2020Quote: ... and (5) developing away uncured photoresist using SU-8 developer (Microchem Corp, Newton, MA) according to standard manufacturer instructions ...
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bioRxiv - Bioengineering 2022Quote: ... SU-8 based (SU-8 50 & SU-8 100, MicroChem, USA) wafer masters were fabricated according to the manufacturer’s protocols (media module ...
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bioRxiv - Neuroscience 2020Quote: ... SU-8 photoresist (SU-8 2000.5, MicroChem) was used to construct the bottom insulating layer ...
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bioRxiv - Genomics 2021Quote: ... SU-8 precursor (SU-8 2000.5, MicroChem) was spin-coated at 4000 rpm ...
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bioRxiv - Bioengineering 2022Quote: ... A negative photoresist of SU-8 (SU-8 2025 and SU-8 2050, MicroChem) and the chrome photomasks (Range Photomasks ...
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bioRxiv - Genomics 2019Quote: ... SU-8 2025 and SU-8 2010 (MicroChem) were used sequentially ...
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bioRxiv - Bioengineering 2023Quote: ... negative photoresist SU-8 (SU-8 2010; MicroChem) was spin-coated on the Si wafer at 3,000 rpm for 30 s ...
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bioRxiv - Bioengineering 2023Quote: ... negative photoresist SU-8 (SU-8 2000.5; MicroChem) was spin-coated on the Si wafer at 3,000 rpm for 30 s ...
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bioRxiv - Bioengineering 2023Quote: ... negative photoresist SU-8 (SU-8 2000.5; MicroChem) labeled with Lissamine rhodamine B ethylenediamine (RhBen ...
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Cyborg islets: implanted flexible electronics reveal principles of human islet electrical maturationbioRxiv - Bioengineering 2024Quote: ... The SU-8 precursor (SU-8 2000.5, MicroChem) was spin-coated to achieve a thickness of either 800 or 400 nm ...
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bioRxiv - Plant Biology 2019Quote: ... we fabricated SU-8 masters (SU-8 2050, Microchem) on silicon wafers using a Karl-Süss MJB4 mask aligner and a laser printed photomask (Selba ...
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bioRxiv - Neuroscience 2021Quote: ... (11) Spin-coating SU-8 precursor (SU-8 2025, MicroChem) at 3000 rpm ...
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bioRxiv - Neuroscience 2021Quote: ... (9) Spin-coating SU-8 precursor (SU-8 2025, MicroChem) at 4000 rpm ...
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bioRxiv - Neuroscience 2021Quote: ... (3) Spin-coating SU-8 precursor (SU-8 2000.5, MicroChem) at 3000 rpm ...
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bioRxiv - Bioengineering 2019Quote: ... Uncrosslinked SU-8 was removed with SU-8 developer (Microchem) and silicon wafers were treated by vapor phase deposition of trichloro (1H ...
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bioRxiv - Bioengineering 2021Quote: ... a 2-μm-thick SU8 encapsulation layer (SU8-2002, Microchem) was spin-coated onto the sample ...
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bioRxiv - Bioengineering 2020Quote: ... A 0.5 μm thick SU-8 photoepoxy (SU-8 2000.5, Microchem) was then spin coated on the PET film ...
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bioRxiv - Bioengineering 2023Quote: ... The SU-8 resist was developed in SU-8 developer (Microchem) for 3 min ...
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bioRxiv - Bioengineering 2023Quote: ... The SU-8 resist was developed in SU-8 developer (Microchem) for 1.5 min ...
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bioRxiv - Bioengineering 2023Quote: ... The SU-8 resist was developed in SU-8 developer (Microchem), rinsed with isopropanol ...
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bioRxiv - Bioengineering 2023Quote: Molds for layer #3 and layer #5 (Figure S1d) are fabricated using SU-8 2075 (MicroChem, Newton, MA, USA) spin-coated at 2150rpm for 30s to create ∼100μm tall patterns (Figure S2a ...
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bioRxiv - Bioengineering 2020Quote: ... the non-polymerized SU-8 is removed with SU-8 developer (Microchem) in a bath for 10 min and then the wafer is cured in an oven at 160 °C.
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bioRxiv - Bioengineering 2023Quote: SU-8 2005 and SU-8 2010 photoresists were procured from Microchem Corporation (USA) ...
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bioRxiv - Biophysics 2021Quote: ... SU 8-3050 (MicroChem) photoresist was spin coated onto the silicon wafer at a specific rotation speed to obtain the desired thickness ...
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bioRxiv - Bioengineering 2020Quote: ... SU-8 2075 (Microchem) was spun coat onto the silicon wafer with a thickness of 120 μm ...
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bioRxiv - Bioengineering 2019Quote: ... SU-8 2150 (Microchem) was spun to a thickness of ~120 μm on a silicon wafer (University Wafers ...
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bioRxiv - Bioengineering 2020Quote: ... We fabricated master molds in SU-8 (SU-8 3050, Microchem, Newton, MA) on 3-inch Si wafers (Silicon Sense ...
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bioRxiv - Biophysics 2023Quote: ... an insulating layer of 500 nm SU-8 (MicroChem Inc., SU-8 2000.5) was patterned by standard photolithography such that only the parallel bars of the microelectrodes were exposed for making contact with the solution ...
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bioRxiv - Plant Biology 2019Quote: ... SU-8 3005 (Microchem USA) was fabricated on a 4-inch silicon wafer by a single-mask photolithography process ...
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bioRxiv - Biophysics 2019Quote: SU-8 2010 (MicroChem Corp.) was used as a base resist to prepare films in a range between 25 nm to 8000 nm ...
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bioRxiv - Bioengineering 2020Quote: ... SU-8 negative photoresist (MicroChem) was coated onto a 6” silicon wafer via spinning coating ...
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bioRxiv - Biochemistry 2020Quote: ... SU-8 2035 photoresist (Microchem) was spin-coated onto the wafer at 1055 rpm for 30 s to reach a desired thickness of 100 μm (± 3 μm) ...
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bioRxiv - Biophysics 2020Quote: ... using SU-8 photoresist (Microchem) on silicon masters (MicroChemicals) ...
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bioRxiv - Bioengineering 2022Quote: ... SU-8 2050 photoresist (MicroChem) was spun onto a silicon mold to achieve a 100 μm thick layer ...
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bioRxiv - Systems Biology 2023Quote: ... SU-8 3000 photoresist (MicroChem) was spun on a silicon wafer (University Wafers ...
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bioRxiv - Neuroscience 2023Quote: ... SU-8 2002 (MicroChem, USA) was spin-coated to achieve a thickness of approximately 3.0 µm (10 s at 500 rpm ...
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bioRxiv - Cancer Biology 2024Quote: ... SU-8 100 photoresist (Microchem) was spun on a 4 inch silicon wafer (University Wafers ...
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bioRxiv - Bioengineering 2023Quote: ... It was further baked at 95°C for 8 min and developed by submerging in SU-8 developer (Microchem SU-8 developer, Fisher Scientific) for at least 15 min ...
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bioRxiv - Bioengineering 2024Quote: ... It was further baked at 95°C for 8 min and developed by submerging in SU-8 developer (Microchem SU-8 developer, Fisher Scientific) for at least 15 min ...
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bioRxiv - Microbiology 2021Quote: Microfluidic devices for drop making were fabricated by patterning SU-8 photoresist (Microchem SU-8 50) on silicon wafers (University Wafer ...